EE 403/503 Introduction to Plasma Processing

Spring 2013

Dates	Subject	Lecture Notes	Study Materials
Jan 16	Introduction to Plasma Processing	Introduction & Plasma Applications
Jan 23	Elementary Processes of excited atoms and molecules in Plasma	Basic Atomic Theory
Jan 30	Elementary processes of charged particles in plasma	Particle Collisions	Introduction & Collision Kinematics Effect of elastic and inelastic collisions on the redistribution
Feb 6	Plasma Statistics and kinetics of charged Particles Kinetics of Excited Particles in Plasma	The Kinetic Theory of Gases	Distribution function Maxwell-Boltzmann distribution Chemical Kinetics, Chemical Equilibrium, Boltzmann Distribution, Radiation
Feb13	Electrostatics, Electrodynamics, and Fluid Mechanics of Plasma	Plasma Properties
Feb 20	Plasma Characteristics	Characteristics of Plasmas & Electrodes	Reading Materials Partially Ionized Gases, M. Mitchner and C. Kruger, Chapter III.1-III.7
Feb 27	DC Discharge (Low Pressure) DC Discharge (Low and High Pressure)	DC Discharges I (Townsend Discharges) DC Discharges II (Glow Discharges)	Gaseous Electronics, Merle N. Hirsch and H.J. Oskam, pp. 329-343 Industrial Plasma Engineering, Reece Roth, pp. 235-254, 275-289, 292-294, 306-307, 352-366
Mar 6	Midterm
Mar 20	DC Discharge (High Pressure) RF Inductive Discharge	DC Discharges III (Arc Discharges) High Frequency Discharges I (RF Inductive)	Industrial Plasma Engineering, Reece Roth, pp. 391-449
Mar 27	RF Capacitive Discharge MW Discharge	High Frequency Discharges II (RF Capacitive) High Frequency Discharges III (MW Discharges)	Industrial Plasma Engineering, Reece Roth, pp. 464-485
Apr 3	Presentations
Apr 10	Presentations
Apr 17	Presentations & Final Test
Apr 24	Presentations