Program:
The program will run from Monday morning through Friday morning, and will include both invited and contributed oral presentations as well as poster sessions.
Click here to download the complete preliminary program as a PDF file.
Confirmed Invited Speakers include:
- Michael Heuken, Corporate Research and Development, AIXTRON AG, Aachen, Germany
- Susan Krumdieck, Department of Mechanical Engineering, University of Canterbury, New Zealand
- Graziella Malandrino, Dipartimento di Scienze Chimiche, Università di Catania, and INSTM, Italy
- Sanjay Mathur, Institute of Inorganic Chemistry, University of Cologne, and Leibniz-Institut für Neue Materialien, Germany
- Lisa McElwee-White, Department of Chemistry, University of Florida, USA
- Hideki Matsumura, School of Materials Science, Japan Advanced Institute of Science and Technology, Japan
- Kostya (Ken) Ostrikov, Plasma Nanoscience Center Australia (PNCA), CSIRO Materials Science and Engineering, Australia
- Ivan P. Parkin, Department of Chemistry, University College London, England
- Joan Redwing, Materials Science and Engineering and Electrical Engineering, Penn State University, USA
- Mikko Ritala, Laboratory of Inorganic Chemistry, University of Helsinki, Finland
- Gary W. Rubloff, Materials Science and Engineering and Maryland Nanocenter, University of Maryland, USA
- Andranik Sarkissian, Plasmionique, Inc., Quebec, Canada
- Ruud Schropp, Debye Institute, Nanophotonics - Physics of Devices, Utrecht University, The Netherlands
- John White, AKT, an Applied Materials Company, USA
Three contributions to the poster sessions will be designated "outstanding posters". Winners will receive a certificate and a copy of Chemical Vapor Deposition: Precursors, Processes, and Applications, edited by Jones and Hitchman (courtesy of the Royal Society of Chemistry)
Symposium topics include:
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CVD fundamentals (gas-phase and surface chemistry, reaction mechanisms, kinetics, multi-scale modeling, structure-property relationships)
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Novel CVD precursors: design, development and characterization
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Innovative CVD strategies (activated processes, plasma-assisted, ALD, iCVD, hybrid strategies)
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Non-conventional materials and complex structures by CVD (nanorods and tubes, nanocomposites, nanopillars, nanoparticles and quantum dots)
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Process control and diagnostics - in-situ spectroscopy and analytical techniques
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Novel processing tools and reactors: CVD from the lab to the fab
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Technological applications of CVD techniques (optoelectronics, chemical sensors, energy production, photocatalysis, MEMS devices, etc.)
