BIOGRAPHY

EDUCATION:

Doctor of Philosophy in Mechanical Engineering, University of Minnesota, Minneapolis, September 1978 - July 1982. Dissertation: Investigation of High-Current Arcs by Computer-Controlled Plasma Spectroscopy.

Hauptdiplom, equivalent to M.S., in Physics, University of Kaiserslautern, West Germany, September 1973 - March 1978. Thesis: Experiments on 10 KeV-electron Impact Excited Fluorescence of Hydrogen Molecules, Wave-length range 200-600nm.

Vordiplom in Physics, Technical University of Munich, West Germany, September 1969 - October 1970.

Master of Business Administration, State University of New York at Buffalo, Buffalo, New York, January 1994 - December 1996.

Abitur, equivalent to pre-university diploma , Studienkollege in Munich, West Germany, September 1968 - March 1969.

EXPERIENCE:

Department of Electrical and Computer Engineering, State University of New York at Buffalo, Buffalo, New York, September 1984-present.

Idaho National Engineering Laboratory, EG&G Idaho, Inc., Research Center, Idaho Falls, Idaho, Summer 1990 and spring 1993.

Department of Chemical Engineering, University of Sherbrooke, Sherbrooke, Canada, June 1986-August 1986.

E.F. Johnson, Inc., Waseca, Minnesota, February 1984-August 1984.

Multi-Arc Vaccum Systems, Inc., St. Paul, Minnesota, November 1983-January 1984.

Institute für Wärmetechnik und Industrieofenbau im Hüttenwesen at the Technical University Aachen, West Germany, August 1982- December 1982.

 

PUBLICATIONS:

 

Editorship:

Heat Transfer in Thermal Plasma Processing, HTD-Vol. 161, ASME 1991.

 

Publications in Selected Areas:

 

Plasma Processing

W.H. Zhuang, D. Gray, K. Etemadi, and D.M. Benenson, "Study of Deposition Offset in Plasma Spray of Zirconia," Journal of Plasma Chemistry and Plasma Processing, Vol. 16, No. 1, March 1996.

 

K. Etemadi, "Formation of Aluminum Nitride in Thermal Plasmas,"  Journal of Plasma Chemistry and Plasma Processing, Vol. 11, No. 1, pp. 41-56 (1991).

Z.Y. Wang, D.D.L. Chung, and K. Etemadi, "Carbon Films Prepared by Plasma Deposition Using a Graphite Cathode," 5th Annual International Sampe Electronics Conference, pp. 487-498, Los Angles, CA, June 18-20,1991.

 

J. Yi, R.L. Wallace, B. Jaganathan, X. Gu, K. Etemadi and W.A. Anderson, "An Analysis of Thin Film Silicon for Photovolatic Energy Conversion," 24th IEEE Photovolatic Specialists Conference, Dec. 5-9, Vol. 2, pp. 1571-74, 1994.

 

K. Etemadi, "PVD/Arc Deposition of Titanium Nitride," Proceedings of 8th International Symposium on Plasma Chemistry, Tokyo, Japan, pp. 1079-1083, September 1987.

M. Suzuki, R. Young, K. Etemadi and E. Pfender, "Application Feasibility and Characteristics of a Gas-Stabilized Free-Burning Arc Reactor," Proceeding of 7th International Symposium on Plasma Chemistry, Eindhoven, The Netherlands, pp. 911-916, July 1985.

 

Plasma Diagnostics

S. Akbar and K. Etemadi, "A Study of an Ar-Cu Mixture Plasma by Emission Spectroscopy," Energex '93 - The 5th International Energy Conference, Seoul, Korea, Oct. 18-22, 1993.

 

S. Akbar and K. Etemadi, "A Fully-Automated Emission Spectroscopic Set-Up for Non-LTE and Gas Mixture Plasma Studies," HTD-Vol. 161, Heat Transfer in Thermal Plasma Processing, ASME 1991.

 

 

S. Snyder, K. Etemadi, M. Roberts and J. Grandy, "Measurement of Gas Temperature in a Thermal Plasma", 10th International Symposium on Plasma Chemistry," Bochum, Germany, August 1991.

 

K. Etemadi and G.Y. Zhao, "Holographic Interferometry in Thermal Plasmas," Proceedings of 9th International Symposium on Plasma Chemistry, Bari, Italy, pp. 342-347, September 1989.

 

Plasma Modeling

 

G.Y. Zhao, M.S. Dassanayake and K. Etemadi, "Numerical Simulation of a Free-Burning Argon Arc with Copper Evaporation From the Anode," Journal of Plasma Chemistry and Plasma Processing, Vol. 10, No. 1, pp. 87-98 (1990)

K. Etemadi, G.Y. Zhao and J. Mostaghimi, "Impact of Cathode Evaporation on a Free-Burning Arc," Journal of Physics D: Applied Physics, Vol. 22, No. 12, pp. 1692-1696 (1989).

 

Plasma Properties

 

M.S. Dassanayake and K. Etemadi, "Thermodynamic and Transport Properties of an Aluminum-Nitrogen Plasma Mixture," J. Appl. Phy., Vol. 66, No. 11, pp. 5240-5244 (1989).